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CombiLineTM - Pumping Stations
Key Benefits
- Pumping station consist of dry backing pump and roots pump
- Pumping speeds of 200, 400, 800 m³/h, final pressure 5 x 10-3 mbar
- Sealing gas with adjustable valve
- Stainless Steel Exhaust silencer and non return valve
- Water cooling not required in most application
(< 100 mbar inlet pressure) - Available for Clean, Medium and Harsh duty applications
- Low sealing gas consumption
- Options include Control cabinet, castors, sound isolation hoods
Applications
- Chemical: Drying, Filtration, Packaging, Distillation,
Solvent Recovery, Freeze Drying - Metallurgy: Vacuum Melting, Casting, Sintering, Brazing, Hardening
- Semiconductor and Coating: CVD, SACVD, HDPCVD, LPCVD, PECVD, MOCVD, PVD, Epitaxy, Plasma Etch, RIE
Whatever your needs are we want you to get it fast and conveniently.
If you can't find what you want contact us:
Phone: 1-800-248-8254
E-Mail: contact@pfeiffer-vacuum.com
Copyright © 2008 Pfeiffer Vacuum GmbH