Pfeiffer Vacuum

Industrial

Dry pumps for industrial applications
Based on the tens of thousands of semiconductor process pumps from the Series 2 installed worldwide, the ACP 120 provides the advantages of the multi-stage Roots pumps in industrial and research & development applications as well. The water-cooled pump can be obtained as a standard design for light duty applications, but also as a purge gas version for slightly corrosive processes or for pumping down condensable media.

Advantages

  • High performance
  • High reliability
  • Simple maintenance

Applications

  • Coating industriy
  • R&D
  • Freeze drying
  • The optimal replacement for rotary vane pumps of the 60 to 100 m3/h-class due to its high pumping speed, low base pressure, high tolerance against cycle operation and low power consumption.
  • No wear in the pump block due to contactless moving rotors - this is the only way a particle-free vacuum can be created.
  • Unrivaled long maintenance intervals - up to four years in light duty applications without disruptions provide for maximum uptime.
  • Optimal combination with Roots pumps as a direct dry replacement for lubricated backing pumps and pumping systems in many industrial systems; e.g. in the coating technology.

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