Pfeiffer Vacuum

Vacuum Solutions for Ion Implanting

Ion implantation is one of the key technologies and is used multiple times along the semiconductor manufacturing chain. During the ion implantation process silicon wafers are bombarded by a beam of electrically charged ions, called dopants. Most of todays tools are multi purpose tools to handle more than one process.

Implant energies reach up to 5 MeV to suit the todays 300 mm production requirements. Various implanter positions like source, beamline, analyzer magnet and load/lock require high vacuum in the range of 10-4 - 10-7 mbar, which his generated by turbopumps.

Main fields of application for our products are:

Our products are used for:

Vacuum measurement

Quantitative analysis

Leak detection

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Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar

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Pfeiffer Vacuum GmbH
Postfach 1280
35608 Asslar

T +49 6441 802-0
F +49 6441 802-1202

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