Pfeiffer Vacuum

Vacuum Solutions for Lithography

One of the first steps in the semiconductor manufacturing chain is the Lithography, which transfers the pattern from the mask/reticle to the layer of photoresist. The kind of lithography method depends on the wavelength of radiation used to expose the photoresist. The reduction in feature size allows to produce higher performance, lower energy consuming IC devices for the next generation.

The vacuum process is run in a high to ultra high vacuum environment in the range of 10-9 mbar. Major system requirements are lowest vibration and contamination free vacuum. The products from Pfeiffer Vacuum are offering ideal performances to comply with the requirements.

Main fields of application for our products are:

Our products are used for:

Vacuum measurement

Quantitative analysis

Leak detection

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Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar

P.O. Box

Pfeiffer Vacuum GmbH
Postfach 1280
35608 Asslar

T +49 6441 802-0
F +49 6441 802-1202

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