SPM 220, 1-200 amu
Sputtering process gas analysis in the range of 1-200 amu
Product description
- SPM ion source for instantaneous process monitoring of up to 10-2 hPa
- Excellent detection limits for H2, O2, H2O and CO2
- Minimized background influence on the measurement result
- Compact dimensions for flexible integration
- Differentially pumped version for pressures of up to 10 hPa
- Easy and flexible system integration through a variety of digital and analog inputs and outputs
- Multiplex operation allows data evaluation of several mass spectrometer systems with a single PC
Product
- SPM 220, for process pressure up to 0,01 mbar, without safety valve SVV 040, 115-230 V (PTM52360)
- SPM 220, for process pressure up to 0,01 hPa, with safety valve SVV 040, 115-230 V (PTM52370)
- SPM 220, for process pressure up to 10 hPa, orifice flange (differentially pumped), 115-230 V (PTM52380)
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Headquarters postal address
Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar
Germany
P.O. Box
Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar
Germany
T +49 6441 802-0
F +49 6441 802-1202
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