Ion Analysis
Quadrupole mass spectrometers are a valuable tool for the analysis of ions in plasma processes.
Positive and negative ions exist in plasmas, which are filtered through a quadrupole and can be detected in a secondary electron multiplier. As the plasma already provides the ions, an ion source in the mass spectrometer is not necessary in most cases. Instead, the devices are equipped with ion optics, which direct the ions to the mass filter in a targeted manner. The ion optics also allow a number of further tests, such as the energy-selective dissolution of ions.
In addition to the use of plasma processes, quadrupole mass spectrometers with ion optics are also suitable for surface analysis tasks such as SIMS (Secondary Ion Mass Spectroscopy) and ICP-MS (Inductively Coupled Plasma Mass Spectroscopy). The highly sensitive detectors in Pfeiffer Vacuum mass spectrometers guarantee excellent analysis results.
The end-point determination of plasma etching processes (End Point Detection) and ion etching (Plasma Milling) in thin-film technology are further areas of application for the detection of externally formed ions with quadrupole mass spectrometers.
The high-quality components of the mass spectrometers allow for optimal adjustment of the instruments to the measurement task. A pure vacuum is a necessity for excellent results in plasma analysis. Pfeiffer Vacuum also provides the necessary vacuum pumps, chambers and components. Our product and application specialists with many years of experience are happy to advise you on the configuration of the appropriate system.
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Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar
Germany
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Pfeiffer Vacuum GmbH
Berliner Strasse 43
35614 Asslar
Germany
T +49 6441 802-0
F +49 6441 802-1202