Pfeiffer Vacuum

Contamination Management Solutions

Solutions for contamination management from Pfeiffer Vacuum improve the yield in the individual process steps of sensitive devices production.

Contamination management for industry
Systems for contamination management are our newest developments specifically for the semiconductor and pharmaceutical industry. Pfeiffer Vacuum's many years of experience as a provider of vacuum technology have shaped our know-how and understanding of the processes, equipment and environment of production systems. Based on this knowledge, we have developed solutions to identify and minimize contamination and increase the yield at each step of the process.

How does contamination occur?
In semiconductor industry, wafers emit reaction by-products during transport and waiting times. Moisture and molecular contaminants borne by air currents (Airborne Molecular Contamination, in short AMC), such as hydrogen fluoride (HF) react in the tight interstices of the transport boxes (pod systems) with oxidants from the ambient air (H2O and O2). During these reactions, undesired crystal growth on structured wafers is triggered which leads to a decline in quality and a decreased production yield.

In pharmaceutical industry, contamination such as humidity, oxygen or microbiological ingress can impact drug stability throughout the product lifecycle.

Innovative solutions from Pfeiffer Vacuum
In order to guarantee the quality and a high yield in production, knowledge about the contaminants in the packaging of devices and their direct environment is important.

In semiconductor industry, continuous analysis within the process cycle is possible with the APA 302. The fully automated process of the ADPC 302 localizes and counts particles on the inner surfaces of transportation carriers. The APR 4300 even goes a step further.

The new AMI 120 by Pfeiffer Vacuum is a unique in-line and non-destructive integrity test system for pharmaceutical blister packs. This innovative solution conducts highly sensitive, quantitative leak measurements in real-time without using any specific tracer gas.


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