Dry pumps for industrial applications
Based on the tens of thousands of semiconductor process pumps from the Series 2 installed worldwide, the ACP 120 provides the advantages of the multi-stage Roots pumps in industrial and research & development applications as well. The water-cooled pump can be obtained as a standard design for light duty applications, but also as a purge gas version for slightly corrosive processes or for pumping down condensable media.
- High performance
- High reliability
- Simple maintenance
- Coating industriy
- Freeze drying
- The optimal replacement for rotary vane pumps of the 60 to 100 m3/h-class due to its high pumping speed, low base pressure, high tolerance against cycle operation and low power consumption.
- No wear in the pump block due to contactless moving rotors - this is the only way a particle-free vacuum can be created.
- Unrivaled long maintenance intervals - up to four years in light duty applications without disruptions provide for maximum uptime.
- Optimal combination with Roots pumps as a direct dry replacement for lubricated backing pumps and pumping systems in many industrial systems; e.g. in the coating technology.