Pfeiffer Vacuum+Fab Solutions at SEMICON Taiwan 2025

Visitors had the opportunity to discuss vacuum pumps, contamination management solutions, leak detectors, valves, gas abatement systems, and comprehensive sub-fab management with experts from Pfeiffer Vacuum+Fab Solutions. Pfeiffer offers high-quality vacuum solutions for the entire semiconductor fab – from clean room to exhaust – helping to optimize manufacturing processes with precision, reliability, and efficiency. Many visitors took the opportunity to visit the booth and discuss the future of the semiconductor market, 3D packaging, and trends in artificial intelligence and technology with the experts.

Vacuum pumps for the semiconductor industry

Several vacuum pumps of particular interest for the semiconductor industry were displayed in the booth. The HiCube Neo vacuum pump unit from Pfeiffer Vacuum+Fab Solutions is ideal for gas analysis in semiconductor fabs. These vacuum pump units combine a turbomolecular vacuum pump with a dry or oil-lubricated backing pump. These modular units enable vacuum levels as low as 10^-10 hPa (mbar).

The COBRA NX 0650A is a high-performance dry screw vacuum pump. It can reach pumping speeds of up to 650 m³/h and achieve an ultimate pressure of ≤0.1 hPa (mbar). It has high vapor and particle tolerance, making it ideal for the harsh operating conditions of the semiconductor industry.

Also presented was the UltiDry multi-stage roots vacuum pump. Its oil-free multi-stage compression ensures clean, dry vacuum without contamination – crucial for sensitive processes in the semiconductor industry. With enhanced powder management and the ability to handle high inlet flow and withstand corrosive gases, the UltiDry is well suited for harsh applications.

Waste gas treatment system

As well as vacuum pumps, Pfeiffer also exhibited the CT-TW-H, a high-temperature thermal-wet gas abatement system. The CT-TW-H combines the wide process coverage of flame abatement with the fuel-free aspects of plasma abatement. The systems feature lower operating costs and secondary emissions and can destroy the molecular process gas NF₃ at class-leading levels with extremely low NOx emissions. They provide a sustainable solution with a minimal carbon footprint for the CVD and metal-etch processes.

Complete product portfolio displayed on screen

A large, interactive touch display in the booth showed the entire product portfolio from Pfeiffer for all fab floors, such as turbomolecular vacuum pumps, valves, gauges, leak detectors, and contamination management solutions for the clean room and multi-stage roots vacuum pumps for the sub floor. For the basement, gas abatement systems, dry screw vacuum pumps, and leak detectors as well as multi-stage roots vacuum pumps were displayed. Visitors could select the products they were interested in and watch informative videos to learn more.