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Airborne Molecular Contamination (AMC) Monitoring

AMC is a leading cause of wafer defects and yield losses in semiconductor fabs. Our comprehensive real-time monitoring systems detect contamination early.

The role of monitoring systems in AMC

As semiconductor device manufacturing becomes increasingly complex with more steps, wafer inspection and metrology are more critical than ever. AMC systems analyze wafers throughout the production cycle, helping to increase manufacturing yield.

AMC solutions from Pfeiffer

Pfeiffer Vacuum+Fab Solutions offers real time clean room AMC monitoring solutions with sensitivity ranging from parts per billion (ppb) to parts per trillion (ppt), dedicated to state-of-the-art semiconductor manufacturing fabs.

Additionally, we provide a variety of in-line monitoring systems for cutting-edge semiconductor manufacturing fabs and R&D centers.

AMC and particle monitoring in FOUP

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Front Opening Universal Pods (FOUPs) are used to transport wafers between process tools. Since wafers spend almost 70% of their manufacturing cycle in FOUPs, monitoring AMC and particles in FOUPs is crucial for achieving the highest manufacturing yield. Additionally, systems should be in-line to detect contamination at all stages of the manufacturing cycle, enabling corrective actions before critical defects occur on wafers.

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AMC monitoring in clean room

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AMC in clean rooms can be generated by various factors, including operators, processes, or external environments. As chip node dimensions continue to shrink, monitoring the clean room environment has become a major concern for most state-of-the-art semiconductor fabs. Additionally, AMC monitoring is required in real time and at extremely high sensitivity to prevent wafer defects.

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FAQ

What are the requirements for AMC monitoring in clean rooms?

Here is an overview of the most important aspects that must be considered:

  • Zero footprint in the clean room
  • Real-time monitoring of the fab
  • Monitoring across multiple areas of the fab
  • Monitoring of inorganic and organic compounds
  • Detection of low compound concentrations (100 ppt)
  • Monitoring of Equipment Front End Module (EFEM)

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What are the requirements for AMC and particle monitoring in FOUPs?

  • Study FOUPs queue time optimization
  • Process tools ramping up
  • Process wafers for tools tuning
  • Determine whether a FOUP needs cleaning, optimizing FOUP cleaner use
  • Check FOUP cleaner efficiency

Which metrology tools for semi fabs are available?

  • Pod Analyzer – APA: Unique solution to control airborne molecular contamination (AMC) in FOUPs.
  • Dry Particle Counter – ADPC: Unique solution to control particles in FOUPs and FOSB.
  • Ambient Multi Port Controlling – AMPC: Innovative solution to control the fab environment.

Which wafer decontamination tools are available?

Pod Regenerator – APR: Unique solution to remove AMC and humidity from FOUPs and wafers