Rugged, powerful turbopump with a pumping speed of up to 1900 l/s for N2, For external TCP 1200 drive electronics, Ideal for applications where the pump is exposed to ionizing radiation, Extensive accessories expand the range of applications, Not suitable for upside down operation, Cooling method, Water cooling
Ideal for ion implantation systems, Optimized pumping speed for light gases, The nickel-plated rotor guarantees resistivity to the dopants used, The intelligent temperature management system reduces process condensation and deposits, Semi S2 and UL/CSA certification
Don't worry we won't leave you in a vacuum