Pfeiffer Vacuum

4.6.4 Process chemistry

In coating process, specially in the production of semiconductors, flat screens and in the solar industry, as demonstrated in the introduction to this chapter, the corrosion resistance of vacuum pumps is of great significance. Besides the process compatibility, the small footprint and the low operating costs are particularly important pump parameters. The P series meets these requirements by lowering power input up to 53 % compared to the previous model while maintaining the same footprint.

This pump series is based on the A 103 P dry-running process pump. We have taken two models from the series and supplemented them with Roots pumps for enhanced pumping speeds and gas throughput in the process pressure range. The power input is kept low due to the six-stage design of the A 103 P and an energy-efficient motor. The six-stage design of the A 103 P reduces the differential pressures between the various stages and also the power input of the pump. Besides the sixth stage, the large-dimensioned inlet stage and the high rotation speed allow for a high pumping speed and a low ultimate pressure.

Placing the silencer on the outlet side directly on the pump block makes for a compact pump design and energy savings through direct heating of the silencer by the pump block without the need for an additional heating sleeve. Temperature-controlled and continuously monitored heating of the entire pump is necessary to prevent the condensation of reaction byproducts.

Due to the P series standby option, not only does the pump use less cooling water, but it also reduces flushing gas consumption beyond the process operation which results in the reduction of operating costs.

Extensive activating and controlling options allow not only a manual control mode but also control through a system control and connection to a monitoring network. Important parameters can be outputted directly and exported for statistical evaluation.

The P series is CE and SEMI S2 compliant.