Industrial
- If a higher pumping speed is required, the ACG 600 G pumping station combines the ACP 120 G dry pump with a roots pump that achieves 600 m3/h.
- High pumping speed 560 m3/h
- Equipped with a flushing gas connection for slightly corrosive processes or for pumping down condensable media
- Optional large volume option
- Industrial dry vacuum pump for many R&D and industrial applications
- High pumping speed 110 m3/h
- Equipped with a flushing gas connection for slightly corrosive processes or for pumping down condensable media
- Optional version for large volumes
Dry pumps for industrial applications
Based on the tens of thousands of semiconductor process pumps installed worldwide, the ACP 120 G provides the advantages of the multi-stage Roots pumps in industrial and research & development applications as well as whenever particle or oil contamination is an issue.
For higher pumping speed requirements, the ACG 600 G pumping group combines the ACP 120 G dry pump with a 600 m3/h Roots pump.
Advantages
- High performance
- High reliability
- Simple maintenance
Applications
- Coating industry
- R&D
- Freeze drying
- The optimal replacement for rotary vane pumps of the 60 to 100 m3/h-class due to its high pumping speed, low base pressure, high tolerance against cycle operation and low power consumption.
- No wear in the pump block due to contactless moving rotors - this is the only way how a particle-free vacuum can be created.
- Unrivaled long maintenance intervals - up to more than four years in light duty applications without disruptions provide maximum uptime.
- Optimal combination with Roots pumps as a direct dry replacement for lubricated backing pumps and pumping systems in many industrial systems; e.g. in the coating technology.