High performance
Dry and energy-efficient, specially designed for semiconductor and coating applications
Flexible
Adjustable settings to match individual process requirements
Certified
SEMI S2 and UL 61010 certified
Technical specifications
Markets & applications
Flat panel display production
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Physical vapor deposition (PVD)
Semiconductor applications
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PVD
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Inspection & Metrology
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Metal & high K etch
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LPCVD / Diffusion
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Oxyde Etch
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Stripping / Ashing
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ALD
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PECVD
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Annealing
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Si Poly etch
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Load Lock & Transfer
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Light deposition
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Ion Implantation
Thin film coating
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Lab coating