Multi-stage Roots Pumps for Harsh Duty Applications
The dry process pumps of the A4X and ADH series are energy- and cost-efficient solutions for demanding processes in the semiconductor, coating and solar industries.
What are harsh duty processes?
Harsh processes are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).
Choosing the right version for your application
A4X pump models include corrosion resistant materials to extend their lifetime and reduce their cost of ownership. The pumps of the ADH range are the right choice for demanding processes that require high pumping speeds for both process gases, N2 and H2. Those pumps can handle large amounts of by-products and offer the highest level of safety for applications running explosive gases such as hydrogen and silane.
The right equipment is crucial
Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.
A4X process pumps by Pfeiffer Vacuum for harsh duty applications
With the A4X series, Pfeiffer Vacuum offers pump solutions for the most demanding processes of the semiconductor and coating industries. The series is based on the proven technology of the dry multi-stage Roots pumps. A high particle tolerance and condensation resistance characterizes the pumps of the A4 series. Their compact and modular construction allows for space-saving integration in existing systems. Long maintenance intervals and low energy consumption provide for low operating costs.
High performance ADH series dry pumps for the latest process applications
The ADH series was developed specifically for applications in demanding processes of the Solar, Semiconductor and LED markets by providing 600 to 4,500 m3/h pumping speed. The pumps offer the best hydrogen pumping efficiency for Solar (a-Si and μ-Si PECVD) and LED (MOCVD GaN, AlGaAs, AlGaInP…) as well as a high H2 pumping speed for semiconductor applications (ALD, Epitaxy and EUV) at the lowest operating costs.
Advantages
- Up to 4,500 m3/h pumping speed
- Same performance with 50 and 60 Hz power supply.
- Low COO due to low power and water consumption
- High powder transfer capacity
- Long maintenance interval
- High energy efficiency due to multi-stage Roots technology, high efficiency motors and limited use of electrical heaters
- High particle tolerance increases tool uptime
- Extended monitoring functionalities for accurate control of pump operating conditions and idle mode capabilities
- Semi S2-0712 and UL 61010 compliant
Applications
- Semiconductor (Etch, PECVD, SACVD ALD, Epitaxy and EUV)
- Flat panel display (FPD)
- Solar cells (a-Si and μ-Si PECVD)
- LED (MOCVD GaN, AlGaAs, AlGaInP…)
- Coating industry: Photovoltaic & LED
