Multi-stage Roots Pumps for Light Duty Applications

Light duty processes require more and more a clean and dry vacuum. The multi-stage Roots pumps by Pfeiffer Vacuum are the ideal solution for industrial and Research & Development applications as well as for back-end and process monitoring in the semiconductor market.

Dry pumps for light duty processes
Based on the proven technology of the dry multi-stage roots pumps, Pfeiffer Vacuum offers a wide selection of pumps for light duty processes. The most important characteristics for pumps in these applications are a constant performance during pump lifetime and robustness as well as high reliability.

Air-cooled multi-stage Roots pumps from the ACP series
The multi-stage Roots pumps of the ACP series are designated for oil- and particle free applications in the pressure range between atmospheres up to 3 · 10-2 hPa. The air-cooled pumps are the optimal replacement for rotary vane pumps.

The specially developed G version of the pumps is designed for the transportation of traces of corrosive gases. This version of the ACP series is recommended for transfer chambers, process monitoring systems and ion beam applications. The CV version of the air-cooled ACP series has a water vapor capacity of up to 1,000 grams per hour. It is designed to avoid steam condensation in the pump block.

Several more specific versions of ACP pumps based on standard version have been developed to better match with specific requirements such as:

  • Fluorine free pumping solution SH and R version,
  • Resistance to nuclear radiation R version,
  • Recycling or recovery of high value gases CP version.

ACP 120 G and ACG 600 G for industrial applications
Based on the tens of thousands of semiconductor process pumps installed worldwide, the ACP 120 G provides the advantages of the multi-stage Roots pumps in industrial applications as well. The water-cooled pump is equipped with a purge gas line for slightly corrosive processes or for pumping down condensable mediums. The ACP 120 G can be combined into different pumping stations with Roots pumps. The Roots pumping station ACG 600 G is the basis of a completely lubricant-free pumping system for vacuum solutions in the decorative or tool coating.

The compact dry pump: the A 100 L and A 200 L
The compact dry pumps A 100 L and A 200 L were developed for the cost-saving integration in semiconductor production systems. The A 200 L has been optimized to meet the harshest frequent pumping cycles of load/locks pumping.


  • Load-lock
  • Transfer chambers
  • Sputtering
  • PVD
  • Metrology
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