The new OmniControl unit allows the comprehensive control of a complete vacuum system using just one device. It combines the control of the total pressure with the control of the pumps. The unit communicates with products that support the Pfeiffer Vacuum RS-485 protocol (e.g. HiPace, HiScroll, HiLobe, MVP and DigiLine). This makes it possible to exchange and process data between various Pfeiffer Vacuum products without any difficulty and without having to invest in additional devices. Optional gauges from the ActiveLine range (with analog output) can also be connected. The 3.5" touch screen with an intuitive user interface ensures easy and convenient control of the vacuum system. For example, a button for switching the devices on and off can be added. The total pressure and the pump parameters (RPM, power input etc.) can be displayed at the same time.

• Find more information about OmniControl >>

Airborne molecular contamination (AMC) in IC fabs is known as the major factor of yield loss. To control and understand where contamination comes from, Pfeiffer Vacuum now brings a unique solution to the semiconductor market to monitor clean rooms as well as EFEM (Equipment Front End Module).

• Further information about AMPC systems >>

The dry process pumps of the XN range are made to meet the requirements of most corrosive processes. With a range from 600 to 2,900 m³/h the XN range covers the requirements of most applications where corrosion resistance is key. This innovative technology allows reducing maintenance frequency and increases pumping lifetime. The cost of ownership is drastically reduced, as well as the tool downtime. The XN range pumps are compatible with pumps from other series.

• Further information about XN series >>

The HiScroll series consists of three dry and hermetically sealed scroll pumps with a nominal pumping speed of 6 - 20 m3/ h. The pumps are especially characterized by their high performance when evacuating against atmosphere due to their unique features. Their powerful IPM* synchronous motors achieve an efficiency that is up to 15% higher than that of conventional drives.

The integrated two-stage gas ballast and safety valve ensure process-specific and safe operation. HiScroll pumps can be easily connected to other Pfeiffer Vacuum products (such as turbopumps or display and control units) as well as to a higher-level external controller, via RS-485 or ProfiNet. The interface enables RPM regulation, situation-specific control of the fan and monitoring of the pump performance. This helps to minimize wear and noise emissions, and ensures longer maintenance intervals.

• Further information about HiScroll Scroll pumps >>

Semiconductor fabrication takes place under clean-room conditions in the high and ultra-high vacuum range. In order to implement and guarantee such conditions, reliable vacuum equipment of premium quality is a must.

A typical semiconductor fab consists of four levels. At the top level, the cleanroom, the production line as well as special systems for contamination management are located. The level below the cleanroom – the so-called “subfloor” – is where the dry pumps for the evacuation of load-locks and transfer chambers are located. The next level below is where the cooling units, current supplies and RF-generators of the plant are located. The lowest level contains dry pumps and the exhaust gas treatment (abatement) equipment.

Explore our solutions for semiconductor fabs – in 3D and from a 360° perspective! Click through the different floors and components of our semiconductor fab model and learn which products Pfeiffer Vacuum offers to fulfill the diverse requirements!

Compact, portable benchtop devices for gas analysis at atmospheric pressure. They are used, in particular, in chemical processes, in the semiconductor industry, metallurgy, fermentation, catalysis, freeze-drying and environmental analysis.

These new analyzers offer the advantages of a low detection limit of <100 ppb (depending on the mass range), a low gas consumption of 1 - 2 sccm and a quick measuring time (up to 1 ms/u).

Up to 90,000 rotations per minute, almost speed of sound at the outer radius, vacuum conditions of up to 10 ^-11 mbar — our turbopumps convince with their performance and reliability.

Accompany the gas molecules on their journey through the turbopump in 3D and learn the functional principle as well as the design of the HiPace from Pfeiffer Vacuum!

Take a look inside the Roots pump from Pfeiffer Vacuum! Learn about the pump components in this 3D sectional model and follow the gas molecules on their way through the OktaLine.

Explore the functional principle and the Roots design.

Light, compact, powerful – the rotary vane pumps of the DuoLine from Pfeiffer Vacuum are the smallest in their pumping speed spectrum on the market.

Explore the design of the pumps and follow the molecules on their way in 3D!