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Modular and flexible solutions for qualitative and quantitative gas analysis

Sputter Process Monitor SPM 220

Sputtering process gas analysis in the range of 1-100 amu
  • SPM ion source for instantaneous process monitoring of up to 10-2 hPa
  • Excellent detection limits for H2, O2, H2O and CO2
  • Minimized background influence on the measurement result
  • Compact dimensions for flexible integration
  • Differentially pumped version for pressures of up to 10 hPa
  • Easy and flexible system integration through a variety of digital and analog inputs and outputs
  • Multiplex operation allows data evaluation of several mass spectrometer systems with a single PC
Sputtering process gas analysis in the range of 1-200 amu
  • SPM ion source for instantaneous process monitoring of up to 10-2 hPa
  • Excellent detection limits for H2, O2, H2O and CO2
  • Minimized background influence on the measurement result
  • Compact dimensions for flexible integration
  • Differentially pumped version for pressures of up to 10 hPa
  • Easy and flexible system integration through a variety of digital and analog inputs and outputs
  • Multiplex operation allows data evaluation of several mass spectrometer systems with a single PC

Real time sputter process gas analyses to 10-2 hPa

The Sputter Process Monitor SPM 220 provides the perfect solution for qualitative and quantitative gas analyses of sputter processes. The combination of the HiPace turbopumping station and mass spectrometer system with a specially developed SPM ion source enables precise up-to-the-minute process gas analysis up to a pressure of 10-2 hPa.

 
As an option, Pfeiffer Vacuum also offers a version with a differentially pumped orifice flange, which makes direct process gas analyses of up to a pressure of 10 hPa possible.

Customer benefits

  • SPM ion source for instantaneous process monitoring
  • Excellent detection limits for H2, O2, H2O and CO2
  • Minimized background influence on the measurement result
  • For directly analyzing, monitoring and controlling processes up to a pressure of 10-2 hPa
  • Differentially pumped version for pressures of up to 10 hPa
  • Multiplex operation allows data evaluation of several mass spectrometer systems with a single PC
  • Compact dimensions for flexible integration
  • Easy and flexible system integration through a variety of digital and analog inputs and outputs

Applications

  • Precise up-to-the-minute analysis of sputter processes up to a pressure of 10-2 hPa
  • Manufacturers and operators of vacuum coating systems
  • Semiconductor production
  • Glass coating
  • Thin-film solar cell generation
  • Research and development
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