SPM 220, 1–200 u

Sputtering process gas analysis in the range of 1–200 u

Product description

  • SPM ion source for instantaneous process monitoring of up to 10-2 hPa
  • Excellent detection limits for H2, O2, H2O and CO2
  • Minimized background influence on the measurement result
  • Compact dimensions for flexible integration
  • Differentially pumped version for pressures of up to 10 hPa
  • Easy and flexible system integration through a variety of digital and analog inputs and outputs
  • Multiplex operation allows data evaluation of several mass spectrometer systems with a single PC


Your local contact
Pfeiffer Vacuum Inc.
24 Trafalgar Square
NH 03063-1988 Nashua

+1 (800) 248-8254
+1 (888) 658-7983
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